Our Programmable Data Density feature enables faster imaging by automatically adjusting the scanning pixel density to reflect the relative size of the feature being scanned. As a result, users generate images with highly detailed regions of interest within larger macrostructures...  +more

The XE-Wafer is a fully automated industrial AFM that can measure surface roughness, trench width, depth and angle measurements on 200mm & 300mm wafers with precision in a production environment. +more

Park Systems provides a reference metrology system for the critical dimension and sidewall analysis. As a fully automated AFM system, the 3DM allows for sidewall, undercut, and line/trench width characterization. With our True Non-Contact Mode^TM, our XE-3DM is capable of imaging the most challenging structures such as soft photoresists and 3D multilayer topologies. +more

Atomic Force Microscopy (AFM) is emerging as an essential tool in many industries. With its ability to accurately measure critical dimensions in the micrometer to nanometer regime, the AFM is becoming an essential tool choice in flat panel applications such as surface roughness, channel height and width measurement, and column/pitch spacer characterization... +more

XE-70 is Park Systems' AFM solution for researchers with limited budget. XE-70 does not compromise any of the innovative technologies of the XE-series that sets it apart from conventional AFMs, supporting the same modes, options, and electronics as all other systems in the XE product line.+more

The Park XE7 is an AFM solution for researchers with a limited budget that does not sacrifice any of the innovative Park AFM technology that sets this product line apart from conventional AFMs. It supports the same modes, options and electronics as all the other Park XE systems. +more

Data accuracy is of paramount importance to nanotechnology researchers as the credibility of their research depends upon accurate results. The NX10, the world's most accurate AFM, is the flagship AFM of Park Systems' new product line. The NX10 brings unparalleled imaging accuracy... +more

As critical dimensions shrink and device complexity increases, the quality of your data is critical for the success of your research, analysis, and ultimately device yield. The key to quality results is accuracy at the nanoscale. Park NX20, the world’s most accurate AFM for FA and QA... +more

The XE-100 is our flagship AFM with reduced drift rate and the Step-and-Scan Automation that provides the ultimate AFM/SPM performance in Non-Contact nanoscale metrology.+more

Take the award-winning XE-100, shrink it such that it can be placed on top of the many popular inverted optical microscopes, and you have the versatile XE-120, an exceptional AFM with expanded sample and interactivity flexibility. The XE-120 is the research grade AFM with industry's only True Non-Contact modeTM imaging for both air and liquid imaging.+more

With the arrival of the XE-150, Park Systems' large sample AFM, Non-Contact AFM imaging has become the most feasible and practical way to scan your large samples with ultimate AFM resolution and reliability. The XY motorized sample stage is optimized for both small and large sample placement, 150 mm x 150 mm, and allows full travel over the entire sample... +more