Award-Winning Research-Grade AFM with Step-and-Scan Automation
The XE-100 is our flagship AFM with reduced drift rate and the Step-and-Scan Automation that provides the ultimate AFM/SPM performance in Non-Contact nanoscale metrology. It is a mid-priced system for materials science, polymers, electrochemistry and other applications in nanoscience and engineering. It can adopt a wide range of optical coupling with its open side access.Supports all XE modes and options
Artifact Free Imaging by Crosstalk Elimination
• Two independent, closed- loop XY and Z flexure scanners for sample and tip
• Out of plane motion of less than 2 nm over entire scan range
• Flat and linear XY scan of up to 100 μm x 100 μm with low residual bow
• Up to 25 μm Z-scan by high force scanner
• Accurate height measurements
• Reduced drift rate of less than 0.5 nm/min
Ultimate AFM Resolution by True Non-Contact Mode
• 10 times larger Z-scan bandwidth than a piezotube
• Less tip wear for prolonged high-quality and high-resolution imaging
• Minimized sample damage or modification
• Immunity from parameter-dependent results observed in tapping imaging
User Convenience by EZ Design
• Wide open access to the tip and sample
• Snap tip exchange & EZ Laser beam alignment
• Dovetail-lock mount for easy head removal
• Direct on-axis optics for high resolution optical viewing
• Motorized optics stage
Full Option Compatibility with Modular Platform
• Full SPM modes and options
• Open side access for optical coupling
• Motorized sample stage with Step-and-Scan automated measurements
XE-100 
